ALIGNMENT MARKET FOR ELECTRON-BEAM DIRECT LITHOGRAPHIC USE AND ITS

Japanese Patent JP2507906

B2

PURPOSE: To make a marker for alignment use in a process whose structure is the same as that of an integrated circuit and to omit a special process used to make the structure of the maker by a method wherein the marker for alignment use is included in a pattern, for lower-part electrode use, which is used to manufacture an integrated circuit chip and the marker for alignment use is arranged in each chip region.
CONSTITUTION: Marker patterns for electron-beam direct drawing use are included in a chip pattern which is exposed by means of ultraviolet rays. When the chip pattern is stepped as the arrangement of 3×3 and exposed, only the marker patterns at the outer circumference form cross-shaped patterns and other patterns form double cross-shaped patterns. Consequently, the outer circumferential marker patterns which are to be utilized can be distinguished easily. Since the marker patterns are overlapped with the same pattern layer as the lower-part electrode of a Josephson junction element, a structure which is formed becomes a composite thin wire by NbN and Nb, a secondary-electron image whose contrast is large is obtained by scanning an electron beam and the position of a mark can be detected easily.

AOYANAGI MASAHIRO
NAKAGAWA HIROSHI
KUROSAWA ITARU
TAKADA SUSUMU

JP29068091A

June 19, 1996

October 09, 1991

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KOGYO GIJUTSUIN

H01L21/027; H01L21/30; H01L39/24; (IPC1-7): H01L21/027; H01L39/24

JP3220784A
JP5768028A
JP5612730A
JP1214117A

Director, Electronic Technology Research Institute, AIST

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