To provide an alignment method and an alignment apparatus, wherein the damages to a substrate and a mask are reduced by reducing the number of alignment operations performed to the substrate and the mask.

The method includes: making a substrate-holding unit 13 hold the substrate 11; thereafter detecting the vibration amplitude of the substrate 11 in a direction of gravitational force; capturing, by using an image capturing apparatus 15, the images of relative positions of alignment marks provided respectively on the substrate 11 and the mask 12, when the detected vibration amplitude is a predetermined value or lower; and performing alignment.