Title:
ALLYL ETHER RESIN AND METHOD FOR PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP2014169428
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an allyl ether resin which has a low halogen content and is suitable for electric/electronic materials and raw materials thereof.SOLUTION: (1) The allyl ether resin is obtained by a reaction of a phenol resin (including a phenol compound) with allyl chloride. In more detail, the allyl ether resin is obtained by carrying out the allyl-etherification by using a metal hydroxide in the presence of allyl chloride, the phenol resin and water. (2) The allyl ether resin is obtained by using a production method characterized in that the content of an allyl chloride polymer in the allyl chloride used in claim 1 is 2% or less.
Inventors:
NAKANISHI MASATAKA
TANAKA EIICHI
SHIRAI KAZUMITSU
TANAKA EIICHI
SHIRAI KAZUMITSU
Application Number:
JP2013045115A
Publication Date:
September 18, 2014
Filing Date:
March 07, 2013
Export Citation:
Assignee:
NIPPON KAYAKU KK
International Classes:
C08G8/36; C07C41/16; C07C43/205
Domestic Patent References:
| JP2011213716A | 2011-10-27 | |||
| JPS5936121A | 1984-02-28 | |||
| JPH0366638A | 1991-03-22 | |||
| JPH0593167A | 1993-04-16 | |||
| JP2013525569A | 2013-06-20 | |||
| JP2000234008A | 2000-08-29 |
Foreign References:
| WO2011136847A1 | 2011-11-03 | |||
| WO2003104177A1 | 2003-12-18 | |||
| EP1514861A1 | 2005-03-16 |