To provide an antireflection base material which is excellent in antireflectivity performance and can reduce interference colors of reflected light.
An antireflection layer 20 consisting of two layers of a high refractive index layer 21 with a refractive index of 1.6 to 1.8 and a low refractive index layer 22 with a refractive index of 1.3 to 1.5 placed in this order is formed on at least one of the surface of a base material 10. The antireflection base material has a difference of 1.8% or less in a reflectivity between the lowest reflectivity in 300 to 800 nm wavelength regions and reflectivities in wavelength regions before and after 100 nm of the wavelength indicating the lowest reflectivity in the reflection spectrum of the surface 25 of the antireflection layer 20. In this case, the refractive index difference between the high refractive index layer 21 and the low refractive index layer 22 is preferably 0.26 or less. Moreover, the wavelength indicating the lowest reflectivity preferably is in the range of 540 to 650 nm. The surface of the base material 10 may be formed with, for example, a hard coat layer 12.
TOKUYAMA KOICHI
JP2000206306A | 2000-07-28 | |||
JPH10182745A | 1998-07-07 |