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Title:
APPARATUS FOR FORMING PROTECTIVE LAYER BY PHOTORESIST
Document Type and Number:
Japanese Patent JPS6161667
Kind Code:
A
Abstract:

PURPOSE: To form easily a thick-walled and smooth protective layer in a short time by forming ruggedness on the outer peripheral surface of an elastic coating roll in a coating mechanism of a photoresist.

CONSTITUTION: A protective layer forming apparatus is provided with a resin coating mechanism, a heating mechanism consisting of a far-infrared lamp 70, and a resin curing mechanism consisting of a UV lamp 60. Ruggedness such as notches is formed on the elastic coating roll 52 of the resin coating mechanism, and the surface of a material to be coated 10 such as an ID card is coated with a larger amt. of resin than the amt. coated with a conventional flat roll while keeping the ruggedness corresponding to the ruggedness of the roll 52. Since the viscosity of the resin is lowered with the heat by the irradiation of the far-infrared lamp 70 at the succeeding stage, a leveling effect is enhanced, and the resin is flattened in a short time. The resin is then cured in a smooth state by the UV rays irradiated from the UV lamp 10 at the succeeding stage.


Inventors:
NISHI YASUO
MITSUTAKE HITOSHI
Application Number:
JP18202784A
Publication Date:
March 29, 1986
Filing Date:
August 31, 1984
Export Citation:
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Assignee:
KONISHIROKU PHOTO IND
International Classes:
B05C9/12; B01J19/12; B05C1/02; (IPC1-7): B01J19/08; B05C9/12
Domestic Patent References:
JPS50122536A1975-09-26
JP55119182B
Attorney, Agent or Firm:
Nobuaki Sakaguchi