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Title:
APPARATUS AND METHOD OF TRANSPORTING SUBSTRATE, AND SEMICONDUCTOR FABRICATION APPARATUS
Document Type and Number:
Japanese Patent JP2006228808
Kind Code:
A
Abstract:

To provide a technology which can aim at the reduction of air-conditioning kinetic energy in the case of conveying while keeping the atmosphere of the ambients of a substrate pure.

A conveyance course is constituted along the arrangement position of a plurality of processors 10 which perform a predetermined treatment to the substrate W, and a conveyor 30 which delivers the substrate W and carries out intermittent conveyance in preparation position P1 corresponding to respective processors 10. On the conveyor 30, a substrate storing container 50 which contains the substrate W is airtightly freely attachably and detachably mounted, and in the state that the substrate W is contained to the substrate storing container 50, it conveys in the receiving and delivering preparation position P2.


Inventors:
NAKADA HIDEO
NAKAJIMA TOSHIKI
Application Number:
JP2005037774A
Publication Date:
August 31, 2006
Filing Date:
February 15, 2005
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
H01L21/677; B65G49/00; B65G49/07
Attorney, Agent or Firm:
Hisao Kobayashi
Kiyoshi Yasushima
Souji Sasaki
Noboru Omura
Takanashi Norio