APPLICATION APPARATUS AND APPLICATION METHOD

Title:

APPLICATION APPARATUS AND APPLICATION METHOD

Document Type and Number:

Japanese Patent JP2012191214

Kind Code:

A

Abstract:

To prevent an application environment from changing.

An application apparatus includes: an application part which applies a liquid material containing easily oxidizable metals and a solvent to a substrate; a chamber enclosing an application space for applying the liquid material through the application part and a post-application transferring space for transferring the substrate to which the liquid material has been applied; and an isolation part isolating the liquid material from an atmosphere in the chamber when a concentration of the solvent in the atmosphere in the chamber exceeds a threshold value.

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Inventors:

MIYAMOTO HIDENORI
SAHODA TSUTOMU

Application Number:

JP2012053292A

Publication Date:

October 04, 2012

Filing Date:

March 09, 2012

Export Citation:

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Assignee:

TOKYO OHKA KOGYO CO LTD

International Classes:

H01L21/368; B05C5/02; B05C11/10; B05C15/00; B05D1/26; B05D3/00; H01L31/04

Attorney, Agent or Firm:

五十嵐光永
志賀正武
棚井澄雄
鈴木三義

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