To synthesize a polymer excellent in heat resistance, chemical resistance, water repellency, dielectric characteristic, electric characteristics and optical characteristics without causing halogen contamination by using an aromatic compound as raw material in which a t-butyl group is substituted for a halogen in polymerization wherein the halogen is an eliminable group for generating a radical, in view of the fact that resins obtained from a halogen- containing aromatic compound such as 1,4-bis(bromodifluoro)benzene have fear of halogen contamination caused by a released halogen in polymerization.
This compound is characterized by having ≥2 (CH2)n(CHOH)t-Bu group (wherein t-Bu is tertiary butyl group; and n is 1-4) and such a compound as shown by formula I. The compound is obtained by reacting an aromatic compound having ≥2 (CH2)n(CHO) group (wherein n is 1-4) with an organometallic reagent.
TEJIMA SEIICHI
TAJIRI KOZO
ASAKO YOSHINOBU
