Title:
電気化学的触媒の原子層堆積
Document Type and Number:
Japanese Patent JP7265982
Kind Code:
B2
Abstract:
A method includes (1) functionalizing a substrate to yield a functionalized substrate; and (2) depositing a catalyst on the functionalized substrate by atomic layer deposition to form a thin film of the catalyst covering the functionalized substrate.
Inventors:
Prinz, Friedrich Bee.
Jaramillo, Thomas Francisco
Graph, Tanya
Shrad, Thomas
Huebner, Gerold
Shoe, Sichen
Kim, Youngmin
Yusuf, Maha
Higgins, Drew Christopher
Jaramillo, Thomas Francisco
Graph, Tanya
Shrad, Thomas
Huebner, Gerold
Shoe, Sichen
Kim, Youngmin
Yusuf, Maha
Higgins, Drew Christopher
Application Number:
JP2019513055A
Publication Date:
April 27, 2023
Filing Date:
September 07, 2017
Export Citation:
Assignee:
The Board of Trustees of the Leland Stanford Junior University
International Classes:
C23C16/02; B01J23/42; C23C16/455; H01M4/92; H01M4/96; H01M8/10
Other References:
Journal of Vacuum Science & Technology A,Vol.33,No.1,p. 01A130-1 - 01A130-9
Attorney, Agent or Firm:
Shusaku Yamamoto
Morishita Natsuki
Morishita Natsuki
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