Title:
極紫外線光とプラズマを組み合わせる原子スケールの加工方法
Document Type and Number:
Japanese Patent JP7398843
Kind Code:
B2
Abstract:
Disclosed is an extreme ultraviolet light and plasma combined atomic-scale processing method. The method involves the synergistic use of extreme ultraviolet light and plasma to treat the surface of a material to achieve atomic-scale processing of the surface of the material. Mode 1 involves using extreme ultraviolet light instead of chemical adsorption for surface activation, thereby broadening the universality of materials and improving the efficiency. Mode 2 involves using extreme ultraviolet light instead of plasma bombardment for material removal, so that the possibility of introducing impurity elements is avoided, and also, since a large number of photons having the same state can coexist (bosons), a very low degree of energy dispersion (i.e., high monochromaticity) can be achieved, and the certainty of processing is improved. Mode 3 involves adding an extreme ultraviolet enhancement and excitation step based on classical plasma ALE, so that material removal caused by ion bombardment alone is changed to being jointly determined by an extreme ultraviolet light field, such that the energy of incident ions and damage to a processed surface can be effectively reduced.
Inventors:
Fusa Toyosu
Application Number:
JP2022542889A
Publication Date:
December 15, 2023
Filing Date:
November 26, 2020
Export Citation:
Assignee:
Tian Jin University
International Classes:
H01L21/3065; B82B3/00; C23F4/00
Domestic Patent References:
| JP2016058590A | ||||
| JP5283385A | ||||
| JP5102101A | ||||
| JP2001176860A | ||||
| JP61265819A | ||||
| JP4308095A | ||||
| JP63208221A |
Attorney, Agent or Firm:
SK Patent Attorney Corporation
Akihiko Okuno
Hiroyuki Ito
Akihiko Okuno
Hiroyuki Ito