Title:
マスク自動交換方法およびマスク自動交換システム
Document Type and Number:
Japanese Patent JP7075488
Kind Code:
B2
Abstract:
An automatic mask replacement method and an automatic mask replacement system based on the correspondence between a substrate group and a mask. The method comprises: a substrate conveyance step of conveying a substrate for each of substrate groups distinguished on the basis of a deviation amount of a pattern formed on the substrate with respect to a screen printing machine; a substrate confirmation step of confirming substrate information during the conveyance of the substrate in the substrate conveyance step; a mask selection step of selecting, from a plurality of masks prepared corresponding to the plurality of substrate groups, a relevant mask according to the result of the substrate confirmation step; and a mask replacement step of feeding the relevant mask to the screen printing machine from an automatic mask replacement machine accommodating the plurality of masks.
Inventors:
Fumitaka Maeda
Application Number:
JP2020525138A
Publication Date:
May 25, 2022
Filing Date:
June 20, 2018
Export Citation:
Assignee:
Fuji corporation
International Classes:
B41F15/12; B41F15/08; B41F15/36; B41F27/12; H05K3/34
Domestic Patent References:
| JP6071847A | ||||
| JP2014019132A | ||||
| JP2013018123A | ||||
| JP2017226151A | ||||
| JP4107146A | ||||
| JP9300581A | ||||
| JP6305111A | ||||
| JP4197684A | ||||
| JP6023747U |
Foreign References:
| US5226366 |
Attorney, Agent or Firm:
Akihiro Hirota
Previous Patent: Acknowledgment signaling processing for radio access networks
Next Patent: Non-aqueous oral composition
Next Patent: Non-aqueous oral composition