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Title:
光源アレイを備えるビーム整列システム
Document Type and Number:
Japanese Patent JP2012528356
Kind Code:
A
Abstract:
A beam alignment system for generating an aligned two-dimensional array of parallel light beams, comprising a beam alignment chamber including a base extending in a length direction and a plurality of reflectors mounted on the base, each having independent yaw and pitch adjustments. The beam alignment system further includes a plurality of arrays of light sources, each generating an array of light beams and being paired with a corresponding reflector, the reflectors being disposed to direct the light beams along the length of the beam alignment chamber forming an aligned two-dimensional array of parallel light beams.

Inventors:
Silverstein Barry Dee
Kircher james robert
Harland Mark A
Application Number:
JP2012513049A
Publication Date:
November 12, 2012
Filing Date:
May 27, 2010
Export Citation:
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Assignee:
Eastman Kodak Company
International Classes:
G02B7/198; F21S2/00; F21V5/04; F21V7/04; G02B19/00; G03B21/14; F21Y101/02
Domestic Patent References:
JP2009505408A2009-02-05
JP2003177353A2003-06-27
JP2006337923A2006-12-14
JP2003516553A2003-05-13
JP2001332789A2001-11-30
Foreign References:
EP2043211A22009-04-01
Attorney, Agent or Firm:
Patent Corporation yki International Patent Office