BLACK MATRIX SUBSTRATE AND PRODUCTION THEREOF

Japanese Patent JP3247904

B2

PURPOSE: To provide high optical density, low reflectivity, high dimensional accuracy and high contrast by providing a transparent substrate and a light shielding layer which is formed on the transparent substrate and internally has metallic particles.
CONSTITUTION: A photosensitive resist layer 3 having 0.1 to 5.0μm thickness is first formed on the transparent substrate 3 by applying a photosensitive resist contg. a hydrophilic resin, a compd. having a diazo group or azide group and a metallic compd. to serve as a catalyst for electroless plating on the substrate and drying the coating. The photosensitive resist layer 3 is then exposed via a mask 9 for a black matrix. This transparent substrate 13 is brought into contact with an electroless plating liquid, by which the metallic particles of the electroless plating are deposited in the exposed parts and the light shielding layer (black matrix) 14 is formed.

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Takuya Hamaguchi
Hiroyuki Kusukawa
Yasutomo Teshima

JP17699092A

January 21, 2002

July 03, 1992

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Dai Nippon Printing Co.,Ltd.

G02B5/20; G02F1/1335; (IPC1-7): G02B5/20; G02F1/1335

JP57104928A
JP490501A
JP6033347U

Yasuo Ishikawa (2 outside)

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