Title:
基板処理装置
Document Type and Number:
Japanese Patent JP6970515
Kind Code:
B2
Abstract:
This substrate processing apparatus comprises: a base which rotates around a vertical rotation axis line; a plurality of holding pins provided, on the base, at intervals along the rotation direction of the base, and holding a peripheral edge portion of the substrate above the base; a facing member disposed between the base and the substrate, and capable of lifting and lowering between a separated position spaced downward from the substrate and a proximate position closer to the substrate than the separated position, wherein the facing member faces the substrate from below; an eave member disposed below the substrate and connected to the holding pins so as to face the facing member from above; and a seal structure for sealing the space between the eave member and a peripheral edge portion of the top surface of the facing member when the facing member is positioned at the proximate position.
Inventors:
Yano Wataru
Masahiro Nonomura
Furukawa Masaaki
Masahiro Nonomura
Furukawa Masaaki
Application Number:
JP2017044080A
Publication Date:
November 24, 2021
Filing Date:
March 08, 2017
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/683; H01L21/304
Domestic Patent References:
| JP2013229552A | ||||
| JP2013069773A | ||||
| JP2006319093A |
Attorney, Agent or Firm:
Patent Business Corporation Ai Patent Office