Title:
キャリブレーションシステム及び描画装置
Document Type and Number:
Japanese Patent JP7013066
Kind Code:
B2
Abstract:
A calibration system, etc. is provided that can perform, as needed, calibration of a beam for exposure radiated onto a long sheet-like substrate in the case of forming a continuous pattern on the substrate. The calibration system includes: an optical system that is provided insertably into and removably from an optical path of the beam that is emitted from the exposure head and enters the exposure surface, the optical system guiding the beam in a direction different from that of the optical path when the optical system is inserted into the optical path; a movement mechanism that inserts and removes the optical system into and from the optical path; and an optical sensor having a light-receiving surface for receiving the beam that is guided by the optical system when the optical system is inserted into the optical path, the optical sensor outputting a detection signal by detecting an irradiation position and an irradiation intensity at the light-receiving surface of the beam that has entered the light-receiving surface.
Inventors:
Masashi Sugawara
Application Number:
JP2021524722A
Publication Date:
January 31, 2022
Filing Date:
May 09, 2020
Export Citation:
Assignee:
Inspec Co., Ltd.
International Classes:
G03F7/24; G03F7/20
Attorney, Agent or Firm:
Yuki Yasu