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Patent Searching and Data


Title:
CARBON FILM AND METHOD FOR MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2003286018
Kind Code:
A
Abstract:

To provide a carbon film having a sufficiently large coefficient of separation and an improved transmission rate compared to a conventional material and to provide a method for manufacturing the film.

The carbon film is obtained by applying a polyamic acid expressed by general formula (3) on the surface of a porous substrate, heating and drying the substrate to form a precursor of the carbon film and thermally decomposing the precursor in an oxygen inactive atmosphere. The compound expressed by general formula (3) is a precursor of polyimide resin expressed by general formula (1). In the formulae, X represents a 2-27C tetravalent group in aliphatic groups, alicyclic groups, monocyclic aromatic groups or the like, n represents an integer from 5 to 10,000, Y is expressed by general formula (2), wherein at least one of phenylene groups constituting the main chain skeleton is m-phenylene group, Z represents a direct bond, -O-, -CO- or the like, m represents an integer from 1 to 3, and each of R1-4 and R'1-4 represents a phenyl group, 4-phenylphenyl group, phenoxy group, 4-phenylphenoxy group or the like.


Inventors:
HIRAMATSU TAKUYA
NISHIYAMA NORIKAZU
MOMOSE WATARU
EGASHIRA YASUYUKI
KAMIYAMA KOREICHI
TAMAI MASAJI
Application Number:
JP2002088845A
Publication Date:
October 07, 2003
Filing Date:
March 27, 2002
Export Citation:
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Assignee:
NGK INSULATORS LTD
KAMIYAMA KOREICHI
MITSUI CHEMICALS INC
International Classes:
B01D53/22; B01D71/02; C01B31/02; C01B37/00; C04B35/52; C08G73/10; (IPC1-7): C01B31/02; B01D53/22; B01D71/02; C01B37/00; C08G73/10
Attorney, Agent or Firm:
Ippei Watanabe