CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Title:

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Document Type and Number:

Japanese Patent JP2023165659

Kind Code:

A

Abstract:

To provide a resist composition which allows a resist pattern having good line edge roughness to be produced.SOLUTION: Specifically, a carboxylate represented by, e.g., formula (I-1) and a resist composition containing the same are shown.SELECTED DRAWING: None

More Like This:

WO/2023/096209	COMPOUND FOR ORGANIC ELECTRIC ELEMENT, ORGANIC ELECTRIC ELEMENT USING SAME, AND ELECTRONIC DEVICE THEREOF
JP2024065099	Organic compounds, light emitting devices and electronic equipment
WO/2022/265034	RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUNDS, INTERMEDIATE, AND COMPOUNDS

Inventors:

NOJO WATARU
SAITO MARINA
ICHIKAWA KOJI

Application Number:

JP2023075885A

Publication Date:

November 16, 2023

Filing Date:

May 01, 2023

Export Citation:

Click for automatic bibliography generation Help

Assignee:

SUMITOMO CHEMICAL CO

International Classes:

C07D333/76; C07C69/54; C08F20/12; C09K3/00; G03F7/004; G03F7/039; G03F7/20

Attorney, Agent or Firm:

Patent Attorney Corporation Shinju Global IP

Previous Patent: Wafer support equipment and film deposition processing equipment

Next Patent: Salt, acid generator, resin, resist composition, and method for producing resist pattern