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Title:
セラミックス膜およびその製造方法ならびに半導体装置、圧電素子およびアクチュエータ
Document Type and Number:
Japanese Patent JP5099366
Kind Code:
B2
Abstract:

To provide a manufacturing method of a ceramic film capable of improving the surface morphology of the ceramic film, to provide the obtained ceramic film, and to provide a semiconductor device and a piezoelectric element to which the ceramic film is applied.

The manufacturing method of a ceramic film includes a step of forming the ceramic film 30 by crystallizing a raw material body 20; the raw material body 20 contains different types of raw materials in a mixed state; and the different types of raw materials differ from one another, in at least one of the crystal growth condition or the crystal growth mechanism in the crystallization of the raw materials.

COPYRIGHT: (C)2009,JPO&INPIT


Inventors:
Eiji Natori
Koichi Koyama
Yuzo Tasaki
Application Number:
JP2008315881A
Publication Date:
December 19, 2012
Filing Date:
December 11, 2008
Export Citation:
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Assignee:
Seiko Epson Corporation
International Classes:
C04B35/00; B28B1/30; C01G1/00; C01G25/00; C01G29/00; C01G35/00; C01G41/00; H01L21/316; H01L21/8242; H01L21/8246; H01L27/105; H01L27/108; H01L41/09; H01L41/187; H01L41/317; H01L41/39; H01L41/43
Domestic Patent References:
JP8253324A
JP10200059A
JP2000159574A
JP10072261A
JP10226572A
JP11163273A
JP6349330A
JP11199327A
Other References:
Jinsong ZHU et al.,"Journal of Applied Physics",米国,1998年 2月 1日,Vol. 83, No. 3,p.1610-1612
Attorney, Agent or Firm:
Yukio Fuse
Mitsue Obuchi
Misa Nagata