Title:
チャンバ洗浄方法
Document Type and Number:
Japanese Patent JP2005524529
Kind Code:
A
Abstract:
A cost-effective and environmentally benign cleaning method is provided which comprises introducing an etch gas into the chamber, performing a first cleaning process to remove the deposited materials at a high rate, and performing a second cleaning process to remove the deposited materials at a high etch selectivity with respect to the materials forming the chamber. The first cleaning process is performed at a first pressure, the second cleaning process is performed at a second pressure. The second pressure is substantially lower than the first pressure to enhance the etching selectivity.
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Inventors:
Hering robert bee
Sison Joseph Sea
Chisaki Yoshihide
Sison Joseph Sea
Chisaki Yoshihide
Application Number:
JP2004503291A
Publication Date:
August 18, 2005
Filing Date:
May 08, 2003
Export Citation:
Assignee:
Aviza Technology, Inc.
International Classes:
B08B7/00; C23C16/44; H01L21/304; (IPC1-7): B08B7/00; H01L21/304
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Shishido Kaichi
Village shrine Atsuo
Disciple Maru Ken
Ino Sato
Fumiaki Otsuka
Shishido Kaichi
Village shrine Atsuo
Disciple Maru Ken
Ino Sato