Title:
大面積プラズマ源および大面積プラズマ源内でプラズマ領域を囲むチャンバハウジング
Document Type and Number:
Japanese Patent JP4505145
Kind Code:
B2
Abstract:
A chamber housing ( 2 ) enclosing a plasma region ( 20 ) in a large area plasma source used for performing plasma assisted processes in large area substrates, the chamber housing ( 2 ) being composed of: a housing member ( 2 ) constituting a substantially vertically extending wall ( 4 ) surrounding a space ( 6 ) corresponding to the plasma region ( 10 ), the housing member ( 2 ) having a plurality of openings ( 32 ) and electrically conductive elements forming an electrostatic shield around the space; a plurality of dielectric members ( 36 ) each having a peripheral edge and each disposed to close a respective opening ( 23 ); and sealing members ( 40, 40', 42 ') forming a hermetic seal between said housing member and said peripheral edge of each of said dielectric members ( 36 ).
Inventors:
Johnson, Wayne El
Application Number:
JP2000592463A
Publication Date:
July 21, 2010
Filing Date:
December 10, 1999
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/205; B01J19/08; H05H1/46; C23C16/00; C23C16/507; H01J37/32; H01L21/26; H01L21/302; H01L21/306; H01L21/3065; H01L21/42; H05H1/00
Domestic Patent References:
| JP10018043A | ||||
| JP10284299A | ||||
| JP10070108A | ||||
| JP10064886A | ||||
| JP10074600A | ||||
| JP10055983A | ||||
| JP9129397A | ||||
| JP8083697A |
Foreign References:
| WO1997004478A1 |
Attorney, Agent or Firm:
Takehiko Suzue
Sadao Muramatsu
Ryo Hashimoto
Toshio Shirane
Sadao Muramatsu
Ryo Hashimoto
Toshio Shirane