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Title:
CHARGED PARTICLE BEAM DEVICE
Document Type and Number:
Japanese Patent JP2010251338
Kind Code:
A
Abstract:

To solve a problem in a conventional SEM, wherein the focus cannot be adjusted in a charged sample, or magnification cannot be correctly calculated, whereby a correct pattern dimension cannot be measured.

A retarding voltage is swept between a retarding voltage, with a primary electron beam not reaching a sample and a retarding voltage with the primary electron beam reaching the sample; the output of a secondary electron detector is detected, to acquire the retarding voltage and characteristics of the output of the secondary electron detector; and the potential of a sample surface is obtained based on the shift of the retarding voltage and the characteristics of the output of the secondary electron detector.


Inventors:
KOMURO OSAMU
NASU OSAMU
Application Number:
JP2010179923A
Publication Date:
November 04, 2010
Filing Date:
August 11, 2010
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP
International Classes:
H01J37/28
Domestic Patent References:
JPH0831892A1996-02-02
JP2005061998A2005-03-10
JP2001052642A2001-02-23
JP2005338096A2005-12-08
JP2002176084A2002-06-21
JP2006019301A2006-01-19
JP2005166542A2005-06-23
JPH0831892A1996-02-02
JP2005061998A2005-03-10
JP2001052642A2001-02-23
JP2005338096A2005-12-08
JP2002176084A2002-06-21
JP2006019301A2006-01-19
Foreign References:
WO1999046798A11999-09-16
WO2003007330A12003-01-23
WO1999046798A11999-09-16
WO2003007330A12003-01-23
Attorney, Agent or Firm:
Manabu Inoue