Title:
CHARGED PARTICLE BEAM DEVICE
Document Type and Number:
Japanese Patent JP2010251338
Kind Code:
A
Abstract:
To solve a problem in a conventional SEM, wherein the focus cannot be adjusted in a charged sample, or magnification cannot be correctly calculated, whereby a correct pattern dimension cannot be measured.
A retarding voltage is swept between a retarding voltage, with a primary electron beam not reaching a sample and a retarding voltage with the primary electron beam reaching the sample; the output of a secondary electron detector is detected, to acquire the retarding voltage and characteristics of the output of the secondary electron detector; and the potential of a sample surface is obtained based on the shift of the retarding voltage and the characteristics of the output of the secondary electron detector.
Inventors:
KOMURO OSAMU
NASU OSAMU
NASU OSAMU
Application Number:
JP2010179923A
Publication Date:
November 04, 2010
Filing Date:
August 11, 2010
Export Citation:
Assignee:
HITACHI HIGH TECH CORP
International Classes:
H01J37/28
Domestic Patent References:
JPH0831892A | 1996-02-02 | |||
JP2005061998A | 2005-03-10 | |||
JP2001052642A | 2001-02-23 | |||
JP2005338096A | 2005-12-08 | |||
JP2002176084A | 2002-06-21 | |||
JP2006019301A | 2006-01-19 | |||
JP2005166542A | 2005-06-23 | |||
JPH0831892A | 1996-02-02 | |||
JP2005061998A | 2005-03-10 | |||
JP2001052642A | 2001-02-23 | |||
JP2005338096A | 2005-12-08 | |||
JP2002176084A | 2002-06-21 | |||
JP2006019301A | 2006-01-19 |
Foreign References:
WO1999046798A1 | 1999-09-16 | |||
WO2003007330A1 | 2003-01-23 | |||
WO1999046798A1 | 1999-09-16 | |||
WO2003007330A1 | 2003-01-23 |
Attorney, Agent or Firm:
Manabu Inoue