Title:
荷電粒子ビーム装置
Document Type and Number:
Japanese Patent JP4571053
Kind Code:
B2
Abstract:
When a sample includes repeated cells, a scale pattern corresponding to the repeated cells is generated. Next, the scale pattern generated is superimposed on the image of the repeated cells of the sample, thereby identifying a destination cell. Moreover, disposition of the repeated cells of the sample is determined based on positions of at least three ends of the repeated cells. Then, the position of the destination cell is identified from this disposition of the repeated cells. Furthermore, a zoom image is generated by a combination of a zoom based on beam deflection function and a zoom based on software. Then, the image shift is performed by software without displacing a sample stage.
Inventors:
Takeshi Onishi
Application Number:
JP2005284733A
Publication Date:
October 27, 2010
Filing Date:
September 29, 2005
Export Citation:
Assignee:
Hitachi High-Technologies Corporation
International Classes:
G01N23/225; H01J37/22; H01J37/28; H01J37/30; H01J37/317; H01L21/66
Domestic Patent References:
| JP62014427A | ||||
| JP2004170395A | ||||
| JP2000031233A |
Attorney, Agent or Firm:
Yusuke Hiraki