Title:
荷電粒子線装置
Document Type and Number:
Japanese Patent JP5514472
Kind Code:
B2
Abstract:
The present invention provides a charged particle beam apparatus that keeps the degree of vacuum in the vicinity of the electron source to ultra-high vacuum such as 10−8 to 10−9 Pa even in the state where electron beams are emitted using a non-evaporable getter pump and is not affected by dropout foreign particles. The present invention includes a vacuum vessel in which a charged particle source (electron source, ion source, etc.) is disposed and a non-evaporable getter pump disposed at a position that does not directly face electron beams and includes a structure that makes the non-evaporable getter pump upward with respect to a horizontal direction to drop out foreign particles into a bottom in a groove, so that the foreign particles dropped out from the non-evaporable getter pump do not face an electron optical system. Or, the present invention includes a structure that is covered by a shield means, or a means that is disposed immediately on a surface of the non-evaporable getter pump but at a position where the electron beams are not seen and has a concave structure capable of trapping the dropout foreign particles on a lower portion of the non-evaporable getter pump.
Inventors:
Soichi Katagiri
Taku Oshima
Takami
Makoto Esumi
Toi Takashi
Kaji Yuji
Taku Oshima
Takami
Makoto Esumi
Toi Takashi
Kaji Yuji
Application Number:
JP2009103490A
Publication Date:
June 04, 2014
Filing Date:
April 22, 2009
Export Citation:
Assignee:
Hitachi High-Technologies Corporation
International Classes:
H01J37/18; H01J37/06
Domestic Patent References:
| JP2007157682A | ||||
| JP49107949U | ||||
| JP52046756A | ||||
| JP53139462A |
Attorney, Agent or Firm:
Polaire Patent Business Corporation