Title:
電子線またはX線用化学増幅系ネガ型レジスト組成物
Document Type and Number:
Japanese Patent JP3989149
Kind Code:
B2
Abstract:
A negative-working chemical amplification-type resist composition for electron beams or X-rays satisfying the characteristics of the sensitivity and resolution•resist pattern for the use of electron beams or X-rays is provided. The chemical amplification-type negative-working resist composition contains (1) an alkali-soluble resin having a weight-average molecular weight of exceeding 3,000 and not larger than 1,000,000, (2) a crosslinking agent causing crosslinkage by an acid, and (3) a compound generating an acid by the irradiation of electron beams or X-rays, wherein the alkali-soluble resin has a specific structure.
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Inventors:
Yutaka Adegawa
Application Number:
JP35802299A
Publication Date:
October 10, 2007
Filing Date:
December 16, 1999
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/038; H01L21/027; C08F12/00; C08L101/12; G03F7/004; G03F7/027; G03F7/039
Domestic Patent References:
| JP11218919A | ||||
| JP10186647A | ||||
| JP8184966A | ||||
| JP8240911A | ||||
| JP11237741A | ||||
| JP10055066A | ||||
| JP10186661A | ||||
| JP10010733A | ||||
| JP8044061A | ||||
| JP4136859A | ||||
| JP2001114825A |
Attorney, Agent or Firm:
Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Kiyozumi Yazawa
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Kiyozumi Yazawa