CLEANING DEVICE FOR INNER WALL OF PULLING CHAMBER

Title:

CLEANING DEVICE FOR INNER WALL OF PULLING CHAMBER

Document Type and Number:

Japanese Patent JPH1045488

Kind Code:

A

Abstract:

To obtain the device for cleaning the inside of a single crystal pulling furnace.

This device is provided with: a pedestal 13 for placing on it, a chamber shell excluding a chamber bottom structure of a semiconductor single crystal pulling-up furnace; a tight-closing means 14 for sealing a clearance between the lower peripheral end of the chamber shell placed on the pedestal 13 and the periphery of the pedestal 13 so as to allow the clearance to be in a tight-closed state; a suction means 15 for reducing the internal pressure of the tight-closed chamber shell on the pedestal 13 to a negative pressure; at least one cleaning fluid jet nozzle (s) 21 placed above the pedestal 13; a nozzle elevating/lowering means for elevating/lowering the cleaning fluid jet nozzle (s) 21; and a nozzle rotation means for rotating the jet nozzle (s) 21 within the chamber shell.

Inventors:

MATSUBARA JUNICHI
YAMAGISHI HIROTOSHI
KURAMOTO MAKOTO
MACHIDA TSUNEHISA
SHIRAISHI YUTAKA
TAKANO KIYOTAKA
IIDA AKIHIRO
TAKASE NOBUMITSU

Application Number:

JP21594796A

Publication Date:

February 17, 1998

Filing Date:

July 30, 1996

Export Citation:

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Assignee:

SUPER SILICON KENKYUSHO KK

International Classes:

B08B3/02; B01J19/00; C30B15/00; C30B35/00; H01L21/208; (IPC1-7): C30B15/00; B01J19/00; B08B3/02; C30B35/00; H01L21/208

Attorney, Agent or Firm:

Masatoshi Sato (1 person outside)

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