Title:
洗浄装置
Document Type and Number:
Japanese Patent JP6653620
Kind Code:
B2
Abstract:
A cleaning liquid includes a liquid (53), a first fine gas bubble group (59a) included in the liquid (53) and having a gas at a first temperature, and a second fine gas bubble group (59b) included in the liquid (53) and having a gas at a second temperature that is lower than the first temperature. Therefore, it is possible to provide a cleaning liquid that exhibits a remarkably better cleaning effect than ever before.
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| WO/2018/055934 | CLEANING DEVICE |
| JP3458009 | STERILIZING AND WASHING METHOD USING ELECTROLYSIS |
| WO/2003/070870 | PROCESS FOR THE TREATMENT OF TEXTILE FIBRE MATERIALS |
Inventors:
Kazuaki Toda
Application Number:
JP2016103624A
Publication Date:
February 26, 2020
Filing Date:
May 24, 2016
Export Citation:
Assignee:
Daido Metal Co., Ltd.
International Classes:
B08B3/10; B08B3/08; C11D7/02
Domestic Patent References:
| JP2012157789A | ||||
| JP2011173086A | ||||
| JP2012004331A |
Attorney, Agent or Firm:
Ochiai Patent Office