Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
CLEANING LIQUID FOR SUBSTRATE SURFACE
Document Type and Number:
Japanese Patent JPH01207182
Kind Code:
A
Abstract:

PURPOSE: To efficiently clean and remove superfine contaminating particles, etc., and to eliminate problems such as generation of static electricity and flawing of a substrate by injecting fine frozen particles toward the substrate.

CONSTITUTION: The frozen particle produced by a frozen particle producing means 20 are injected by an injecting means 7 toward the substrate 1 held by a holding means 40. The contaminants are dissolved by a solvent while the fine contaminating particles and dirt on the substrate 1 are blown off by the impact of the fine frozen particles. As a result, an excellent cleaning effect is obtd. and since a cleaning brush is not used at all unlike in the conventional manner, the problem such as contamination by the wear of the brush and the degraded cleaning efficiency by generation of the static electricity generated from the friction of the electrostatically chargeable brush are solved.


Inventors:
TADA MASUTA
AKAMATSU KAZUHIKO
FUKUMOTO HAYAAKI
OMORI TOSHIAKI
YANAGI MOTONORI
Application Number:
JP3232288A
Publication Date:
August 21, 1989
Filing Date:
February 15, 1988
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TAIYO SANSO CO LTD
MITSUBISHI ELECTRIC CORP
International Classes:
H01L21/304; B08B7/00; (IPC1-7): B08B7/00; H01L21/304
Domestic Patent References:
JPS62267742A1987-11-20
JPS603555A1985-01-09
Attorney, Agent or Firm:
Mamoru Takada (1 person outside)