Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
CLEANING MEMBER, TRANSFER MEMBER WITH CLEANING FUNCTION, AND CLEANING METHOD FOR SUBSTRATE PROCESSOR
Document Type and Number:
Japanese Patent JP2008066710
Kind Code:
A
Abstract:

To provide a cleaning member capable of easily, certainly, and sufficiently removing fine foreign matter, preferably, foreign matter of a submicron scale; to provide a transfer member with a cleaning function that has the cleaning member; and to provide a cleaning method for a substrate processor using the transfer member with the cleaning function.

The cleaning member includes a cleaning layer having a plurality of projections of pillarlike structures on its surface. The aspect ratio of the projections of the pillarlike structures is 5 or more.


More Like This:
JP3635870ADHERING METHOD AND SLICING METHOD OF SEMICONDUCTOR SINGLE CRYSTAL INGOT
JP4451429Cleaning equipment
JP4568504Wiring forming method, semiconductor device and its manufacturing method
Inventors:
SUGAO HISAKI
TERADA YOSHIO
UENDA DAISUKE
NAMIKAWA AKIRA
YOSHIDA YOSHITOKU
MAENO YOHEI
Application Number:
JP2007169958A
Publication Date:
March 21, 2008
Filing Date:
June 28, 2007
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
NITTO DENKO CORP
International Classes:
H01L21/304; H01L21/677
Domestic Patent References:
JP2005218968A2005-08-18
JP2005312608A2005-11-10
JP2005237447A2005-09-08
Attorney, Agent or Firm:
Katsuto Momii
Yoshida Masayasu



 
Previous Patent: METHOD OF MANUFACTURING NONVOLATILE SEMICONDUCTOR MEMORY DEVICE, AND NONVOLATILE SEMICONDUCTOR MEMOR...

Next Patent: YIELD PREDICTIVE SYSTEM AND METHOD FOR SEMICONDUCTOR DEVICE