Title:
洗浄方法及び洗浄装置
Document Type and Number:
Japanese Patent JP6865402
Kind Code:
B2
Abstract:
To provide a cleaning method that can perform cleaning while suppressing scattering around of washing water at cleaning by using a gas and liquid for cleaning.SOLUTION: A two-fluid nozzle-form cleaning method that atomizes liquid using a gas includes: mixing a gas with liquid in a gas/liquid mixture part 15 when a distance L between a surface of an object to be cleaned 74 and a spray device 10 is within a cleaning distance, and spraying the atomized liquid from an injection nozzle 16a to clean the object to be cleaned.SELECTED DRAWING: Figure 1A
Inventors:
Isamu Aokura
Tabata Daisuke
Akira Isomi
Tabata Daisuke
Akira Isomi
Application Number:
JP2017134528A
Publication Date:
April 28, 2021
Filing Date:
July 10, 2017
Export Citation:
Assignee:
Panasonic IP Management Co., Ltd.
International Classes:
B08B3/02; B60S3/04
Domestic Patent References:
| JP2006255590A | ||||
| JP11333334A | ||||
| JP7047341A | ||||
| JP10286496A | ||||
| JP2006093591A | ||||
| JP2011198892A | ||||
| JP2010287881A | ||||
| JP2015107442A |
Attorney, Agent or Firm:
Mitsuo Tanaka
Samejima Mutsumi
Hiroshi Okabe
Mitsuo Wada
Samejima Mutsumi
Hiroshi Okabe
Mitsuo Wada