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Title:
COMPOSITION AND DEVICE FOR GAS SORPTION AND THEIR MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2009101364
Kind Code:
A
Abstract:

To provide a composition with a small thickness to be placed in a gas sorbing device, for sorption of both a residual gas in an evacuated chamber and impurities in an inert gas, which can be stored and transported without being kept under an inert atmosphere after production of a mixture.

The device is provided with a composition for gas sorption comprising a gas sorbing component A dispersed in a cross-linked porous matrix. The composition is produced by a process comprising: a step of mixing and dispersing at least one precursor into a matrix containing a polysiloxane resin, wherein the precursor can be converted into the gas sorbing component A through the following heat treatment, and the polysiloxane resin is resistant in a continuous treatment at a temperature up to 650C when filled with an inorganic material; and a step of subjecting the thus obtained mixture to a heat treatment under vacuum or an atmosphere of a gas inert to the component A under a condition such that the precursor is converted into the gas sorbing component A and the cross-linked structure of the polysiloxane resin is retained.


Inventors:
CATTANEO LORENA
GALLITOGNOTTA ALESSANDRO
Application Number:
JP2009030355A
Publication Date:
May 14, 2009
Filing Date:
February 12, 2009
Export Citation:
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Assignee:
GETTERS SPA
International Classes:
B01J20/28; B01D53/04; B01D53/26; B01D53/28; B01J20/26; C08J3/20; C08K3/00; C08L83/04; G01N1/00; H01L51/50; H05B33/04; H05B33/10; G01N
Attorney, Agent or Firm:
Axis International Patent Business Corporation