Title:
COMPOSITION FOR POLISHING AND CONCENTRATED LIQUID OF THE SAME, AND POLISHING METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2022039461
Kind Code:
A
Abstract:
To provide means for reducing a surface roughness (Ra) and suppressing occurrence of scratch while maintaining a high polishing rate, in polishing of a polishing object containing a resin.SOLUTION: A composition for polishing contains a particulate alumina and a dispersion medium, in which α-alumina of the particulate alumina is 50% or more and sphericity of the particulate alumina is 80% or more.SELECTED DRAWING: None
Inventors:
IZAWA YOSHIHIRO
Application Number:
JP2020144486A
Publication Date:
March 10, 2022
Filing Date:
August 28, 2020
Export Citation:
Assignee:
FUJIMI INC
International Classes:
C09K3/14; B24B37/00; C09G1/02; H01L21/304
Attorney, Agent or Firm:
Hatta International Patent Corporation