Title:
電子ディスプレイおよび基材の洗浄およびエッチング用組成物
Document Type and Number:
Japanese Patent JP4069961
Kind Code:
B2
Abstract:
This invention relates to a composition for cleaning and etching the surface in fabricating electronic displays and the substrates. Specifically this invention relates to a composition to effectively remove the contaminants by cleaning, to remove any contaminants on the surface, and to etch SiO2 and Si substrate in the fabrication process of electronic displays, quartz devices, wafer, and semiconductor wafer. According to this invention, it is possible to clean and etch more efficiently and conveniently. Also The surface roughness is improved. Further the composition of this invention can be made available in powder type for preparing a defined amount of solution. It provides the conveniences in transportation, handling and storage.
Inventors:
Lee, Kiwon
Application Number:
JP53415798A
Publication Date:
April 02, 2008
Filing Date:
January 21, 1998
Export Citation:
Assignee:
Innoroth Company Limited
International Classes:
C09K13/08; H01L21/308; C03C15/00; C09K13/04; C11D3/04; C11D7/04; C23F1/20; C23F1/24; C23G1/12; H01L21/304; H01L21/306; H01L21/311; H01L21/3213
Domestic Patent References:
| JP60249332A | ||||
| JP8048996A | ||||
| JP7216392A | ||||
| JP9031669A |
Attorney, Agent or Firm:
Kyosei International Patent Office
Hideaki Sato
Masaaki Kobayashi
Hideaki Sato
Masaaki Kobayashi