Title:
化合物及び酸発生剤
Document Type and Number:
Japanese Patent JP7366202
Kind Code:
B2
Abstract:
To provide a novel compound useful as an acid generator for a resist composition, an acid generator using the compound, a resist composition containing the acid generator, and a resist pattern forming method using the resist composition.SOLUTION: The resist composition contains a compound represented by general formula (bd1) and comprising an anionic moiety and a cationic moiety. In the formula (bd1), R-Reach represent a monovalent organic group, provided that at least one of them has an acid-dissociable group; Rx-Rx, Ry-Ryand Rz-Rzeach represent a hydrocarbon group or a hydrogen atom or may be bonded to each other to form a ring structure; and at least one of Rx-Rx, Ry-Ryand Rz-Rzhas an anionic group.SELECTED DRAWING: None
Inventors:
Takuya Ikeda
Masatoshi Arai
Masatoshi Arai
Application Number:
JP2022113235A
Publication Date:
October 20, 2023
Filing Date:
July 14, 2022
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
C07C381/12; C07C309/12; C07C309/17; C07C309/24; C07D313/06; C09K3/00; G03F7/004
Domestic Patent References:
| JP2011006400A | ||||
| JP2009019028A | ||||
| JP2017102267A | ||||
| JP2014224984A | ||||
| JP7186516B2 | ||||
| JP2015148693A | ||||
| JP2012003249A | ||||
| JP2008290980A | ||||
| JP7094145B1 |
Foreign References:
| WO2017179727A1 |
Attorney, Agent or Firm:
田▲崎▼ 聡
Ryu Miyamoto
Emi Hattori
Takuya Shiraishi
Ryu Miyamoto
Emi Hattori
Takuya Shiraishi