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Title:
導電性保護膜及びその製造方法
Document Type and Number:
Japanese Patent JP5295102
Kind Code:
B2
Abstract:
Disclosed is a conductive diamond-like carbon protective film having both high hardness and high wear resistance, which is produced by a specific film-forming method. Also disclosed is a method for producing such a conductive diamond-like carbon protective film. Specifically disclosed is a method for producing a conductive protective film for protecting a substrate, wherein a conductive diamond-like carbon protective film containing a predetermined amount of boron is formed on the substrate by using a mixed gas containing a hydrocarbon raw material gas and a boron doping gas at a predetermined ratio. It is preferable that one or more members selected from the group consisting of trimethyl borate, trimethyl boron and triethyl boron are used as the boron doping gas.

Inventors:
Hideki Nakamori
Hiratsuka master
Application Number:
JP2009511836A
Publication Date:
September 18, 2013
Filing Date:
April 17, 2008
Export Citation:
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Assignee:
Nanotech Co., Ltd.
International Classes:
C23C14/06; C23C14/02; C23C14/32; C23C16/02; C23C16/27; C30B29/04
Domestic Patent References:
JP2004137541A2004-05-13
JPH07268607A1995-10-17
Other References:
JPN6013013186; 並木和広 他: 'イオン化蒸着法によるDLC太陽電池の作製 -硼素混合比の特性-' 日本大学理工学部学術講演会論文集 電気系部 , 20051116, pp. 1092-1093
JPN6013013187; 上村公勇 他: 'イオン化蒸着法によるボロンドープDLC薄膜の作製' 応用物理学会学術講演会講演予稿集 , 20050907, p. 485 7a-P1-6
Attorney, Agent or Firm:
Shoji Ishihara
Shinsuke Ishihara



 
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