Title:
光近接補正用収束技術
Document Type and Number:
Japanese Patent JP5039882
Kind Code:
B2
Abstract:
Layout correction is accomplished using a forward mapping technique. Forward mapping refers to mapping of fragments from a reticle layout to a target layout, while backward mapping refers to mapping of fragments from the target layout to the reticle layout. Forward mapping provides a technique for making an unambiguous mapping for each reticle fragment to a corresponding target layout fragment. The mapping does not necessarily provide a one-to-one correspondence between reticle fragments and target layout fragments. That is, multiple reticle layout fragments can map to a single target layout fragment. An edge placement error for the target layout fragments is used to make positioning corrections for the corresponding reticle fragment(s). Edge placement error can be determined, for example, with a simulation process that simulates a manufacturing process using the reticles.
Inventors:
Cobb, Nicholas Bailey
Saffria, Emil
Saffria, Emil
Application Number:
JP2009234332A
Publication Date:
October 03, 2012
Filing Date:
October 08, 2009
Export Citation:
Assignee:
Mentor Graphics Corporation
International Classes:
G03F1/68; G03F1/00; G03F1/36; G06F17/50; H01L21/027
Domestic Patent References:
| JP2000112114A | ||||
| JP11283904A | ||||
| JP11212247A | ||||
| JP2003526110A | ||||
| JP11015129A | ||||
| JP7106227A | ||||
| JP9319067A | ||||
| JP8076348A | ||||
| JP2000020564A | ||||
| JP2003525470A |
Attorney, Agent or Firm:
Inaoka cultivation
Mio Kawasaki
Maruyama Ondo
Mio Kawasaki
Maruyama Ondo