CORROSION-RESISTANT MEMBER, ITS MANUFACTURING METHOD AND SEMICONDUCTOR/LIQUID CRYSTAL MANUFACTURING APPARATUS USING THE SAME

Title:

CORROSION-RESISTANT MEMBER, ITS MANUFACTURING METHOD AND SEMICONDUCTOR/LIQUID CRYSTAL MANUFACTURING APPARATUS USING THE SAME

Document Type and Number:

Japanese Patent JP2007290933

Kind Code:

A

Abstract:

To provide a solution for the problem in a member which is used in an apparatus for manufacturing a semiconductor or a liquid crystal and is thus required to have higher corrosion resistance, that the member has insufficient corrosion resistance against a corrosive halogen gas or plasma thereof used in the apparatus for manufacturing the semiconductor or the liquid crystal and thus cannot be used over a long period of time.

The corrosive member comprises a substrate made of ceramic or metal and a corrosion-resistant film formed on at least a part of the surface of the substrate. The corrosion-resistant film essentially comprises Y2O3, provided that the composition ratio of the Y component is larger than 40 mol% and equal to or smaller than 80 mol%.

Inventors:

NAKAHARA MASAHIRO

Application Number:

JP2006123143A

Publication Date:

November 08, 2007

Filing Date:

April 27, 2006

Export Citation:

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Assignee:

KYOCERA CORP

International Classes:

C04B41/87; C23C14/08; C23C14/32; H01L21/205; H01L21/3065; H01L21/31

Domestic Patent References:

JP2005097685A	2005-04-14
JP2004010981A	2004-01-15

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