PURPOSE: To supply a CVD gas material unstable to temp. into a reaction vessel without deteriorating the material by storing the material cooled to a specified low temp. in the vessel and gasifying the material by heating.
CONSTITUTION: A Peltier element 13 set on the side wall of a vessel 3 is energized to cool the vessel 3, and a CVD gas material in the vessel 3 is kept at a temp. of ≤0°C. Under such conditions, a heater 21 is energized to heat the vaporizer 20, pipeline 4 and valve 5 to a specified temp. range. A vibrator 14 provided to the thermostatic bath 10 in contact with the vessel 3 is energized to vibrate the vessel 3. The CVD gas material in the vessel 3 is turned into the mist 7 which is floated in the vessel 3 from the liq. surface. The floating mist 7 is introduced into the heated vaporizer 20, brought into contact with the inner wall of the vaporizer 20 and filter 23 and gasified to a CVD gas 2, which is sent into a reaction vessel 100 to form a film.
HONGO MIKIO
TAKADA ATSUKIMI
KAWAJI MOTONORI
YAMADA TOSHIO
