DEPOSITION SYSTEM AND DEPOSITION METHOD

Title:

DEPOSITION SYSTEM AND DEPOSITION METHOD

Document Type and Number:

Japanese Patent JP2008214694

Kind Code:

A

Abstract:

To provide a deposition system in which the formation of a carbon-containing layer can be suppressed, and a deposition method.

The deposition system (200) deposits an electrolytic film on a hydrogen separation film (31) having hydrogen permeability and includes a chamber (30) where the hydrogen separation film (31) is arranged, and an adsorption member (35) which is disposed within the deposition system (200) and has carbon dioxide adsorptivity equivalent to or better than that of the hydrogen separation film (31). According to the deposition system (200), the carbon dioxide is adsorbed onto the adsorption member (35). Thereby, the formation of the carbon-containing layer on the deposition surface of the hydrogen separation film (31) can be suppressed.

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Inventors:

ITO NAOKI
SHIOKAWA SATOSHI
SUZUKI NAOTO

Application Number:

JP2007053635A

Publication Date:

September 18, 2008

Filing Date:

March 05, 2007

Export Citation:

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Assignee:

TOYOTA MOTOR CORP

International Classes:

C23C14/54; H01M4/94; H01M8/02; H01M8/10

Attorney, Agent or Firm:

Shuhei Katayama
Toshiyuki Hatta
High Yoshitaka Hayashi

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