Title:
電子顕微鏡及び３次元構造の深さ算出方法
Document Type and Number:
Japanese Patent JP7091263
Kind Code:
B2
Abstract:
To measure a depth of a three-dimensional structure, for example, a hole or a groove, formed in a sample without preparing information in advance, an electron microscope detects, among emitted electrons generated by irradiating a sample with a primary electron beam, an emission angle in a predetermined range, the emission angle being formed between an axial direction of the primary electron beam and an emission direction of the emitted electrons, and outputs a detection signal corresponding to the number of the emitted electrons detected. An emission angle distribution of a detection signal is obtained based on a plurality of detection signals, and an opening angle is obtained based on a change point of the emission angle distribution, the opening angle being based on an optical axis direction of the primary electron beam with respect to the bottom portion of the three-dimensional structure.
Inventors:
Kenji Yasui
Mayuka Osaki
Makoto Suzuki
Hirohiko Kitsuki
Toshiyuki Yokosuka
Daisuke Bizen
Yusuke Abe
Mayuka Osaki
Makoto Suzuki
Hirohiko Kitsuki
Toshiyuki Yokosuka
Daisuke Bizen
Yusuke Abe
Application Number:
JP2019008299A
Publication Date:
June 27, 2022
Filing Date:
January 22, 2019
Export Citation:
Assignee:
Hitachi High-Tech Co., Ltd.
International Classes:
H01J37/22; G01N23/2251; H01J37/28
Domestic Patent References:
| JP2017191758A | ||||
| JP2004347483A | ||||
| JP2015115239A | ||||
| JP201716791A | ||||
| JP2015106530A |
Foreign References:
| US6930308 | ||||
| TW473892B | ||||
| TW201901290A |
Attorney, Agent or Firm:
Polar Patent Attorney Corporation