Title:
DESIGNING METHOD FOR PHOTOMASK
Document Type and Number:
Japanese Patent JP3642327
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method of setting two of an exposure quantity tolerance, a pattern size tolerance, and a defocusing tolerance (set tolerances) and designing a photomask according to an expected value of the remaining tolerance (unset tolerance).
SOLUTION: This method comprises (a) setting a plurality of evaluation patterns of the photomask and also setting the set tolerance; (b) varying a quantity associated with the unset tolerance as a variation quantity and finding a transfer pattern according to the evaluation patterns; (c) finding the size of the transfer pattern; (d) finding the maximum value of the variations of the set values of the set tolerances as a value of the unset tolerance; (e) varying the set values of the set tolerances and repeating the processes (b) to (d); and (f) finding the expected value of the unset tolerance for each evaluation pattern according to a probability density function representing the distribution of set values of the set tolerances and the value of the unset tolerance and setting the pattern size tolerance of the photomask so that the expected value is larger than a desired value.
Inventors:
Minoru Sugawara
Application Number:
JP2002319876A
Publication Date:
April 27, 2005
Filing Date:
February 29, 1996
Export Citation:
Assignee:
ソニー株式会社
International Classes:
G03F1/26; G03F1/29; G03F1/30; G03F1/32; G03F1/68; G03F7/20; H01L21/027; (IPC1-7): G03F1/08; G03F7/20; H01L21/027
Domestic Patent References:
| JP8202020A | ||||
| JP7175204A | ||||
| JP6302492A |
Attorney, Agent or Firm:
Takahisa Yamamoto
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