Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
DEVELOPER FOR PHOTOSENSITIVE RESIN PLATE AND DEVELOPING METHOD
Document Type and Number:
Japanese Patent JPH10301298
Kind Code:
A
Abstract:

To improve the developing rate and image reproducibility even when water with high hardness or low hardness is used, by incorporating a hydrophilic component containing ionic hydrophilic groups.

The developer is used to remove an unexposed part of a photosensitive resin plate after exposure, and the resin plate has a photosensitive resin compsn. layer which contains one of ionic hydrophilic groups expressed by (a) -COOM, (b) -SO3M- (c) -SO4M, and (d) (-O)3-nPO(OM)M. To the developer, a compd. having an ability to form a chelate compd. with polyvalent metal ions and/or phosphoric acids are added. In the formulae, M is a uni- or bivalent metal atom or an ammonium compd. and (n) is 1 or 2. As for the photosensitive resin compsn., it contains a hydrophilic component containing ionic hydrophilic groups in order to have developing property with a water-based developer. Photosensitivity is given to the components above described by adding photopolymerizable unsatd. monomers, photosensitizer and other additives.


Inventors:
SHIBANO HIROSHI
KASHO YOSHIHIRO
Application Number:
JP4385798A
Publication Date:
November 13, 1998
Filing Date:
February 25, 1998
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
TOYO BOSEKI
International Classes:
G03F7/00; G03F7/32; (IPC1-7): G03F7/32; G03F7/00