Title:
現像方法および現像装置
Document Type and Number:
Japanese Patent JP7249867
Kind Code:
B2
Abstract:
The present invention relates to a developing method to pattern photosensitive film having a high resolution and a developing apparatus thereof. According to the present invention, a substrate is maintained in a horizontal posture by a spin chuck in a developing unit of a developing processing unit and a resist film is formed on the upper surface of the substrate, wherein the resist film is exposed. A rinse liquid cooled down to a lower temperature than room temperature is supplied to the substrate, such that the temperature of the substrate is adjusted at a lower temperature than the room temperature. Then, supply of the rinse liquid is stopped. Moreover, a developing liquid cooled down to a lower temperature than room temperature is supplied on the upper surface of the substrate, such that the resist film reacts with the developing liquid. Then, the cooled developing liquid is removed from the upper surface of the substrate, such that reaction between the resist film and the developing liquid is stopped.
Inventors:
Yuji Tanaka
Masaya Asai
Masahiko Harumoto
Chisayo Nakayama
Hiroshi Arisawa
Tomohiro Motono
Koji Kanayama
Masaya Asai
Masahiko Harumoto
Chisayo Nakayama
Hiroshi Arisawa
Tomohiro Motono
Koji Kanayama
Application Number:
JP2019091610A
Publication Date:
March 31, 2023
Filing Date:
May 14, 2019
Export Citation:
Assignee:
Screen Holdings Co., Ltd.
International Classes:
H01L21/027; G03F7/30; H01L21/304
Domestic Patent References:
| JP7142322A | ||||
| JP2008109058A | ||||
| JP2011151326A | ||||
| JP2012142564A |
Attorney, Agent or Firm:
Masahiro Nakagawa
Fukushima Shoto
Go Sakane
Hideyuki Sawamura
Fukushima Shoto
Go Sakane
Hideyuki Sawamura
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