Title:
DEVICE FOR EXPOSING TO X-RAY
Document Type and Number:
Japanese Patent JPS6055624
Kind Code:
A
Abstract:
PURPOSE:To simplify the structure of a device, eliminating need of a light source for detecting an alignment mark, by using for a shutter a material having sufficienctly high transmittance to the ray of ultraviolet-visible ranges to shield the X-rays of a soft range. CONSTITUTION:In X-ray lithography for transferring a pattern on an X-ray mask 4 to an X-ray sensitive material 5 with synchrotron orbital radiation ray (SOR) 2, a shutter 3, when it is made of molten quartz for example, transmits approximately 10% of the SOR having wavelengths lambda larger than 3,000Angstrom , but, on the contrary, it blocks most of X-rays of 3-40Angstrom that contribute to X- ray lithography. The SOR transmitted by the molten quartz shutter 3 has a total light volume of more than 10mW, that is sufficient for detecting the alignment marks 6 and 7 on the X-ray mask 4 and substrate 5 to be exposed to the X-rays. Therefore, a light source 10 and an optical system for irradiating the light to the alignment marks which are conventionally required separately, can be omitted.
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Inventors:
KIMURA TAKESHI
MOCHIJI KOUZOU
TAKANASHI AKIHIRO
OOHAYASHI HIDEHITO
MOCHIJI KOUZOU
TAKANASHI AKIHIRO
OOHAYASHI HIDEHITO
Application Number:
JP16322383A
Publication Date:
March 30, 1985
Filing Date:
September 07, 1983
Export Citation:
Assignee:
HITACHI LTD
International Classes:
G03F7/20; G03F9/00; H01L21/027; (IPC1-7): H01L21/30; G03F7/20
Attorney, Agent or Firm:
Katsuo Ogawa (1 person outside)
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