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Patent Searching and Data


Title:
DEVICE AND METHOD FOR TREATING SUBSTRATE
Document Type and Number:
Japanese Patent JP2001343499
Kind Code:
A
Abstract:

To improve accuracy and efficiency in treating (for example, cleaning) the surface of a substrate.

In a conveyance route for the substrate 10, a water tank 15 that stores pure water is located in the lower of a lamp house 12 is provided with a dielectric barrier discharge lamp 1. An atmosphere of a mixed fluid of nitrogen gas and water vapor is produced in the lower position of the lamp house 12, by immersing and placing a nitrogen gas supplying pipe 19 with an outlet which consists of numerous micropores opened in the circumferential shank of the pipe 1 inside the water tank 15 to generate bubbles of the nitrogen gas therein. A reducing active specie [H.] and an oxidizing active specie [.OH] are generated, by decomposing water vapor through the agency of ultraviolet light irradiated from the discharge lamp 1, whereby the surface of the substrate 10 is cleaned dry, and contact angle is reduced.


Inventors:
KINOSHITA KAZUTO
WADA NORIYA
KENMORI KAZUHIKO
Application Number:
JP2000165839A
Publication Date:
December 14, 2001
Filing Date:
June 02, 2000
Export Citation:
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Assignee:
HITACHI ELECTR ENG
International Classes:
G21K5/00; B01J19/12; G02F1/13; G02F1/1333; H01L21/304; (IPC1-7): G21K5/00; B01J19/12; G02F1/13; G02F1/1333; H01L21/304
Attorney, Agent or Firm:
Shunji Kagei