Title:
DEVICE FOR SURFACE TREATMENT
Document Type and Number:
Japanese Patent JPS6057614
Kind Code:
A
Abstract:
PURPOSE:To unify the concentration of a material gas in a treatment container by providing leading openings for the jigs for carrying samples arranged in multilayer in the device for surface treatment. CONSTITUTION:A treatment container 1 performs the surface treatment of samples, e.g. wafers 3 and flat electrodes 2b composes jigs for carrying the wafers 3. The electrodes 2b are provided with leading openings 10a arranged near the positions where the wafers 3 are placed and the electrodes are arranged in multilayer and in parallel in the container 1. A material gas is introduced into the container 1 from a gas inlet 4 and is exhausted from an outlet 5. A high-frequency power source 6 produces a high-frequency electric field among the electrodes 2b and a heater 7 heats the container 1 to a treatment temperature. Supporting members 9 support the wafers 3 to the electrodes 2b. Thus, the unreacted material gas flowing along the walls of the container 1 is diffused toward the center of the container 1 through the leading openings 10a so that the concentration of the material gas in the container 1 becomes uniform resulting in an enhancement of treatment quantity of samples and a uniform surface treatment.
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Inventors:
SAKAI HIDEO
Application Number:
JP16497783A
Publication Date:
April 03, 1985
Filing Date:
September 09, 1983
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H01L21/205; (IPC1-7): H01L21/31
Attorney, Agent or Firm:
Akio Takahashi