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Title:
プラズマを形成するための装置および方法ならびに電極
Document Type and Number:
Japanese Patent JP5175023
Kind Code:
B2
Abstract:
The present invention provides an arrangement and method for generating a uniform and stable plasma. The arrangement comprises a discharge space (7) between at least a pair of electrodes (1, 2), which electrodes (1, 2) are arranged for providing an electric field and for generating a plasma in the electric field. At least one of the electrodes (1) has a boundary surface (6) with the discharge space (7). The boundary surface is comprised of one or more alternately arranged conductive (4) and insulating regions (5). The invention further relates to an electrode (1) for use in the arrangement described. The invention may, for example, be used in dielectric barrier discharge configurations, or in arrangements for generating plasmas at atmospheric pressures, or for generating plasmas at low temperatures, such as generating atmospheric pressure glow plasmas (APG) for material processing or surface (3) treatment purposes.

Inventors:
Hindrick Willem De Vries
Jean Bastien Boustra
Jugen Ardea
Mauritius Cornels Maria van de Sanden
Application Number:
JP2004235565A
Publication Date:
April 03, 2013
Filing Date:
August 12, 2004
Export Citation:
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Assignee:
Fujifilm Manufacturing Europ B.V.
International Classes:
H05H1/24; B08B6/00; C23C16/509
Domestic Patent References:
JP6049243A
JP2001527689A
JP2000239005A
JP2001127533A
JP2050969A
JP2004527073A
JP2002526923A
Foreign References:
WO2002065820A1
Other References:
Yasushi Hayashi, et al.,Analysis of electromagnetic oscllations in dielectric cathode with grid electrode,J. Appl. Phys.,米国,American Institute of Physics,2003年 7月,Vol. 94, Number 1,page 749-755
Attorney, Agent or Firm:
Masatake Shiga
Takashi Watanabe
Masakazu Aoyama
Yasuhiko Murayama
Shinya Mitsuhiro