Title:
反応室壁上のダイヤモンド被膜及びその製造方法
Document Type and Number:
Japanese Patent JP4358509
Kind Code:
B2
Abstract:
A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a diamond containing surface and process for manufacture thereof.
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Inventors:
O'Donnell, Robert, Jay.
Dowel Tea, John, Yi.
Chan, Christopher, Shee.
Dowel Tea, John, Yi.
Chan, Christopher, Shee.
Application Number:
JP2002555455A
Publication Date:
November 04, 2009
Filing Date:
November 21, 2001
Export Citation:
Assignee:
LAM RESEARCH CORPORATION
International Classes:
C23C14/06; C23C30/00; B01J19/02; C23C16/02; C23C16/27; C23C16/44; H01J37/32; H01L21/205; H01L21/3065
Domestic Patent References:
| JP11251093A | ||||
| JP10027778A | ||||
| JP7237996A | ||||
| JP4157157A |
Attorney, Agent or Firm:
Yasunori Otsuka
Nishikawa Keio
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Nagakawa Yukimitsu
Nishikawa Keio
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Nagakawa Yukimitsu