Title:
回折に基づく重ね合わせ散乱計測
Document Type and Number:
Japanese Patent JP7101786
Kind Code:
B2
Abstract:
A method of monitoring overlay is used in a manufacturing process in which successive layers are deposited one over another to form a stack. Each layer may include a periodic structure such as a diffraction grating to be aligned with a periodic structure in another layer. The stacked periodic structures may be illuminated to form + and − first order diffraction patterns from the periodic structures. An image of the stacked periodic structures may be captured including + and − diffraction patterns. The + and − diffraction patterns may be compared to calculate the overlay between successive layers.
Inventors:
Rubasibsky Yubal
Pasco Bar Yuri
Levinski Vladimir
Manassen Amnon
Pasco Bar Yuri
Levinski Vladimir
Manassen Amnon
Application Number:
JP2020536834A
Publication Date:
July 15, 2022
Filing Date:
October 29, 2018
Export Citation:
Assignee:
KLA Corporation
International Classes:
G03F9/00; G03F7/20; H01L21/66
Domestic Patent References:
| JP2017537317A | ||||
| JP2017518533A |
Attorney, Agent or Firm:
Patent Corporation yki International Patent Office