Title:
DIFFRACTION OPTICAL ELEMENT AND ITS MANUFACTURE, AND OPTICAL EQUIPMENT
Document Type and Number:
Japanese Patent JPH1130711
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To mass-produce high-precision diffraction optical elements in multi- layered structure at low cost by anisotropic dry etching. SOLUTION: Relating to a diffraction optical element in two-layered structure, materials are selected according to optical characteristics, an organic coating material is molded at a specific position of a material to be processed by using a pattern which is so designed as to obtain grating structures of diffraction gratings of a 1st and a 2nd layer in desired shapes respectively, the desired shape is formed by performing anisotropic dry etching to obtain the diffraction grating 11 of the 1st layer; and TiO2 , etc., having large dispersion is coated by vapor deposition or sputtering, an organic coating material is molded on the TiO2 film by a pattern, and TiO2 is processed into the desired shape by anisotropic dry etching to obtain the diffraction grating 12 of the 2nd layer.
Inventors:
NAKABAYASHI MASAAKI
Application Number:
JP20236897A
Publication Date:
February 02, 1999
Filing Date:
July 11, 1997
Export Citation:
Assignee:
CANON KK
International Classes:
G02B5/18; (IPC1-7): G02B5/18
Attorney, Agent or Firm:
Hibiya Masahiko