To provide a divided exposure method which permits the efficient utilization of a substrate even if the distance from a surface drawn with a pattern of a photomask to a light shielding body is not shortened.

A photomask 1A and a substrate 4A are relatively moved and the distance from the exposure region of the adjacent substrate 4A is shortened by relatively moving the photomask 1A and the substrate 4A so as to reduce the width of a non-light projecting space 26 of the photomask 1A, by which the exposure patterns of the exposure regions 21 to 24 are transferred to the substrate 4A.